In this Court, the plaintiff's trade secret infringement prohibition and prevention of the plaintiff's trade secret change against the defendants.

1. Each of the testimony and arguments of the witness J and I, each of the facts alleged as the premise 【Evidence of Evidence】 1 to 4, 11, 12, 14, 16, 18, 20, 67, 70, Eul evidence of No. 2, 4, 5, Eul evidence of No. 25, Eul of No. 25 (including the branch numbers if there are branch numbers; hereinafter the same shall apply)

A. Party 1) Plaintiff (the first trade name was “M”) but later changed to the current trade name on July 1, 2010, via “F” etc.

(2) On November 10, 1982, the Defendant C (hereinafter “Defendant C”) was established on November 10, 1982 and operated a business manufacturing and selling special gas, such as SiH4, WF6, DCS, which was used by the DF3 semiconductors for semiconductor manufacturing semiconductors, and used for semiconductors, semiconductors or semiconductors, and CVD (CVD) devices used for the increased capture of L CDs, and log pockets, and provided the Plaintiff’s technical relationship between the Plaintiff and the Plaintiff on August 20, 199 and the Plaintiff’s basic design was expanded by around 199.

3) On April 25, 2001, Defendant D joined the Plaintiff Company as an employee of the technical research institute planning team, served as the management team, purchase team vice head, etc., and retired on May 10, 201. 4) Defendant B is a company aimed at manufacturing, processing, and selling basic compounds, and is running NF3 manufacturing and selling business since around 2007.

B. NF3’s manufacturing process 1) NF3’s manufacturing process consists of a synthetic process that generates NF3 and a refining process that enables crubber, a smoking tower, and a dF3 to nF3 by refining various antis that are contained in NF3. In accordance with NF3’s manufacturing technology, DF is subject to DF.